Read e-book online Design for Manufacturability with Advanced Lithography PDF

By Bei Yu,David Z. Pan

This publication introduces readers to the main complex learn effects on layout for Manufacturability (DFM) with a number of patterning lithography (MPL) and electron beam lithography (EBL). The authors describe intimately a collection of algorithms/methodologies to solve matters in glossy layout for manufacturability issues of complicated lithography. Unlike books that debate DFM from the product point or actual production point, this publication describes DFM options from a circuit layout point, such that almost all of the serious difficulties should be formulated and solved via combinatorial algorithms.

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Design for Manufacturability with Advanced Lithography by Bei Yu,David Z. Pan


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